SAMSUNG ELECTRONICS CO., LTD. (Suwon-si, KR)
Examples of the inventive idea pertain to a semiconductor device and more particularly to a three-dimensional memory device including three-dimensionally arranged memory cells, and methods for fabricating the identical.
2. Description of the Related Art
To increase a memory capability using the three-dimensional integrated circuit (3DIC) memory method can be used. 3D-IC is a memory technique which allows you to arrange memory cells three-dimensionally.
A punch-and-plug is one 3D-IC technique. Punch-and-plug technique creates thin layers of multi-layered material onto the substrate and creates plugs that penetrate these thin layers. Through this technique, without an increase in production costs, a three-dimensional memory device can be constructed with more memory capacity.
Examples of the innovative concept could be a three-dimensional (3D), semiconductor device with large memory capacity.
Examples of the inventive concept include a 3D semiconductor device that has a number of stacked structures and smaller pad areas.
In accordance with examples of the inventive concept, a three-dimensional semiconductor device includes a stacked structure including a plurality of conductive layers placed on a substrate an area along a primary direction between sidewalls of the upper layer of conductive material and an lower conductive layer that is less than a distance in a second direction between sidewalls of the upper layer of conductive and lower layer of conductive, the first and second directions intersecting each other, forming a planar parallel to a surface supporting the substrate, as well as vertical channel structures penetrating the stacked structure.
Additional bit lines may be used to connect vertical channel structures with one another, with the bit lines running in the first direction.
The stacked structure could also include insulating layers interposed between the conductive layers. The sidewalls of the conductive layers, and the insulating layers that are exposed in the first direction are parallel to one another.
The widths of the plurality conductor layers in the first direction could be roughly equal.
First pads can be found in the layers of conductive. Each pad is exposed by the sequentially stacking of conductive layers. They are separated from vertical structures in the second direction.
Contact plugs are able to be added to the device.
The conductive layers may include second pads, each of which is exposed by a sequentially stacked conductor layer and being spaced apart from the vertical structures in the first direction.
The size of the pad in the first direction might be smaller than a width of the pad in the second direction.
A distance along a third direction between sidewalls of the upper and lower of the conductive layers may be less than the distance in the second direction between sidewalls of the lower and upper layers of the layer that conducts electricity. the third direction being opposite to the second direction.
The distance between the vertical channel structure and the edge of the stacked structure might be shorter in the first direction than in the second.
According to other example embodiments of the inventive concept the three-dimensional semiconductor device is a first stacked structure on a substrate, the first stacked structure including the first memory region, which is divided by a firstvertical channel structure and the first pad region located adjacent to the first memory area, and a second stacked structure on the first stacked structure and the second stacked structure comprising a second memory region penetrated by a second vertical channelstructure as well as a second pad region close to the second memory region and, in a plan view, the major axes of the initial and second structures intersect each one.
The distance between the initial memory region and an edge of the first pad region could be less in the first direction parallel to the top surface of the substrate, than in a or a third direction which crosses the first direction. Likewise, the distance between the second memory region and an edge of the second pad area could be larger in the first direction, but not in the second.
The distance between first memory region (and the edge) of the first pad area may be smaller in the opposite direction from the second. The distance between the second memory region (and the edge) of the second pad region could be smaller in the opposite direction than in first.
The width of the first stacked structure along the initial direction might be less than the width of the second stacked structure along the first direction, and a width of the first stacked structure in the second direction could be greater than awidth of the second stacked structure along the second direction.
An interlayer insulation layer can be added between the primary pad area and the second structure.
Another embodiment of the inventive idea is a three-dimensional semiconductor device that features the stack structure. The stacked structure comprises amemory regions , and at least one pad space adjacent to a first side. A vertical channel structure is inserted into the memory region. Pads are located on the conductive layer in the pad region.
A conductive layer can have a first sidewall that extends significantly in the first direction, and a secondary sidewall that extends considerably in the second direction. The sides of the first of two layers of conductors stacked sequentially in the multiple are aligned with one another to create a uniform flat plane within the memory region. The flat plane can be found located on a different side than the one that is the first.
The pads and the memory region may be adjacent to each other only along the first direction.
To make a flat plane in the memory area, all the sides of the stacked conductive layers can be aligned one another. The flat plane is situated on a different side from the one on which it is located.
A second stacked arrangement may be added to the first stacking structure. The second stacked structuring could include a channel within the memory area, and pads on conductive layers in the pad region and the major axes of both the first and second structures could cross one another.Click here to view the patent on USPTO website.
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A patent is granted by the government to safeguard an invention, patents grant the inventor with exclusive rights to develop, utilize and sell the invention? society benefits when a new technology is brought to the market. The benefits can be realized directly as people are able to achieve previously unattainable feats or by the economic opportunities which innovation can bring (business growth, jobs).
Many pharmaceutical firms and researchers from universities are seeking protection under patents for their research and development. Patents can be granted for the creation of a product, process or method for making new materials. Patent protection is granted to an invention that is useful or novel and is not yet known by other people in the same area.
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Patents transform inventors’ knowledge into a marketable asset that opens up new possibilities to create jobs and boost business growth through licensing or joint ventures.
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Patenting could lead to the development of new inventions and ideas. This information can encourage the development of new ideas and could qualify to be protected by patents.
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Patent-protected technology that is commercially viable can be used for financing technological research and development (R&D), which increases the likelihood for better technology in the future.
Intellectual property ownership is a way to convince investors and lenders that there are legitimate chances to market your product. One powerful patent may open the door for multiple financing opportunities. Patents and other IP assets are able to be used as collateral or security for financing debt. You may also present investors with your patent assets to increase the value of your business. Forbes and other sources have pointed out that each patent could increase anything from $500,000 to one million dollars to company valuation.
A well-written business plan is essential for startups. It must be based on IP and explain the way your product or service is distinctive. Investors will also be impressed if you have IP rights are secure or are on the verge of becoming secure, and if they support your business plan.
It is crucial to keep an invention secret before applying for patent protection. The public disclosure of an invention before filing it could often erode its originality and render it patent-infringing. Pre-filing disclosures, such as for investors, test marketing, or other business partners must be done after signing a confidentiality contract.
There are many kinds of patents and knowing them is essential to protecting your invention. Utility patents cover new techniques and machines. Design patents cover ornamental designs. Patents for utility are the best option and shield the proprietor from copycats and other competitors. Most often, utility patents are issued to improve or modify existing inventions. Utility patents can also be used to improve or alter existing inventions. A process patent could be a way to describe the actions or methods of performing a particular act. A chemical composition will include the combination of ingredients.
What is the length average of patents? Although utility patents are valid for 20 years from the date of the initial filing, they can be extended through delays at the patent office.
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Patent searches are an essential step when you’re writing an application for patent. This will enable you to look at different ideas and provide an understanding of the potential of them. You’ll be able reduce the nature of your invention. Also, you can discover the current latest developments in your field of invention. You’ll be able to get a better idea of what your invention should be and be better prepared to write your patent application.
How to Search for Patents
The first step to get your patent is to do the patent search. You can do a google patent search or do a USPTO search. Patent-pending is the name used to describe the product protected by the patent application. You can use for the public pair to locate the patent application. After the patent office has approved the patent application, you will be able to perform a patent search to find the granted patent, and your product is now patented. It is also possible to use the USPTO search engine. Read on for more details. A patent lawyer or attorney can assist you with the process. Patents granted in the United States are granted by the US trademark and patent office or the United States patent office. The trademark office also evaluates trademark applications.
Are you interested in finding other similar patents? Here are the steps to follow:
1. Create a list of terms that describe your invention, based on the purpose, composition and usage.
Start by writing down a concise detailed description of your idea. Be sure to avoid using terms that are generic such as “device,” “process,” and “system.” Instead, consider synonyms to the terms you initially chose. Then, take note of important technical terms and keywords.
Utilize the following questions to help you identify key words or concepts.
- What’s the goal of the invention? Is it a utilitarian device or an ornamental design?
- Is inventing a method to make something or carry out a function? Is it a product or process?
- What is the composition and function of the invention? What is the physical makeup of the invention?
- What is the goal of the invention?
- What are the technical words and terms that describe the characteristics of an invention? A technical dictionary will help you locate the right words.
2. Use these terms to search for relevant Cooperative Patent Classifications at the Classification Text Search Tool. If you’re not able to locate the appropriate classification for your invention, scan through the classification’s class Schemas (class schedules). You may want to consider substituting the terms you use for describing your invention, if you fail to find any results in your Classification Text Search with synonyms like the ones you used in the first step.
3. Check the CPC Classification Definition for confirmation of the CPC classification you have found. The hyperlink to a CPC classification definition will be provided in the event that the title of the classification has a blue box that includes “D” to its left. CPC classification definitions will help identify the specific classification’s scope and therefore you’re sure to choose the most relevant. In addition the definitions may include search tips and other suggestions that may be useful for further study.
4. Retrieve patent documents with the CPC classification from the Patents Full-Text and Image Database. By focusing your search on abstracts and illustrations you can narrow your search for the relevant patent documents.
5. This list of patent publications is the best to look at for any similarities with your invention. Pay attention to the specification and claims. You may find additional patents by referring to the patent examiner and applicant.
6. You can retrieve published patent applications that meet the CPC classification you selected in Step 3. You can also use the same method of search that you utilized in step 4 to limit down your search results down to just the most relevant patents by reading the abstracts and representative drawings for each page. After that, take a close look at the patent applications that have been published with particular attention paid to the claims as well as additional drawings.
7. Find additional US patent publications using keyword searching in PatFT or AppFT databases, classification searching of non-U.S. patents as described below, and searching for non-patent literature disclosures of inventions using web search engines. Here are some examples:
- Add keywords to your search. Keyword searches may turn up documents that are not well-categorized or have missed classifications during Step 2. For example, US patent examiners often supplement their classification searches with keyword searches. Think about the use of technical engineering terminology rather than everyday words.
- Search for foreign patents using the CPC classification. Then, re-run the search using international patent office search engines such as Espacenet, the European Patent Office’s worldwide patent publication database of over 130 million patent publications. Other national databases include:
- European Patent Office (EPO) provides esp@cenet to access a network of Europe’s patent databases with access to machine translation of European patents.
- Japan Patent Office (JPO) – with access to machine translations of Japanese patents.
- World Intellectual Property Organization (WIPO) offers PATENTSCOPE with a full-text search of published international patent applications and machine translations for some documents, as well as a list of international patent databases.
- Korean Intellectual Property Rights Information Service (KIPRIS)
- State Intellectual Property Office (SIPO) with machine translation of Chinese patents.
- Other International Intellectual Property Offices with online patent databases include Australia, Canada, Denmark, Finland, France, Germany, Great Britain, India, Israel, Netherlands, Norway, Sweden, Switzerland, and Taiwan.
- Search non-patent literature. Inventions can be made public in many non-patent publications. It is recommended that you search journals, books, websites, technical catalogs, conference proceedings, and other print and electronic publications.
To review your search, you can hire a registered patent attorney to assist. A preliminary search will help one better prepare to talk about their invention and other related inventions with a professional patent attorney. In addition, the attorney will not spend too much time or money on patenting basics.